LARGE AREA IMAGING
SF100 SPEED & SIMPLICITY
What a radical idea!
Go where no scientist has gone before
Faster than a speeding bullet
A penny saved is a penny earned
Lean on me
AUTOMATED STAGE SUBASSEMBLY
OPTIONAL REDUCTION KIT
SIMPLE USER-FRIENDLY SOFTWARE
- A benchtop photolithography exposure system
that’s radically easy to use. Simple, one button exposure in a mere 4
square feet.
- You call the shots.
Miniaturize and pattern designs on virtually any material of virtually
any shape and size, even grey scale and features down to 5 microns!
- Instantaneous prototyping. Pattern
prototypes in seconds not the weeks or months needed for systems
requiring photomasks.
- Competitively priced with
deliriously low operational and maintenance
costs.
- We give you peace of mind with complete customer
service, personalized support and a complete Warranty.
Rapid prototyping just got faster. Now you can automatically, easily,
and quickly obtain adjacent pattern stitching for large area imaging,
with level to level exposure capability for multi-layer substrates. The
SF-100 Auto Stage is our latest addition to the maskless
photolithography line. 365 nm energy (i-line) and 429 nm energy
(gline) are standard.
This addition to our product line was designed using our proven and
reliable optical design. The SF-100 Auto Stage preserves the best
features of the manual tool including one-button operation, grey scale
capability, curved and other non-flat substrate patterning, as well as
low maintenance and operational costs. The SF-100 product family is
the ideal starting tool for new microdevice labs. It is also an ideal
complementary system for existing photolithography processes.
The automated stage provides movement in the XYZ and theta
directions. It is sized to handle substrates that are up to 6 x 6 inches
square. We provide 1 inch of travel in the Z direction to accommodate
substrates of various thicknesses.
Produce features as small as 5 microns using the SF-100’s optional
reduction kit available for manual and Auto Stage tools. The SF-100
can be purchased with reduction optics or upgraded later in the field.
The SF-100 software provides you complete user control. Our
proprietary software was written using the industry standard,
LabVIEW software, assuring you reliability. A graphical user interface
Laser and Electron Beam (E-Beam) pixel writers have been proven to
be very successful in photoresist patterning of fine features. Laser
writers produce features of <1.0 μm routinely, while E-Beam
lithography systems easily produce features of <0.25 μm. Although
both of these systems produce exceptional line quality and small
features, both types of systems have difficulty in quickly producing
large features. Since both laser and E-Beam systems write features
one pixel at a time, their throughput is very slow when designs are very
dense or when designs contain large features.
Intelligent Micro Patterning’s SF-100 provides a cost effective solution
for improving the throughput of laser and E-Beam writers. The SF-100
is an elegantly simple exposure system that provides exceptional
imaging quality. Light is introduced into the system using a mercury arc
lamp. A direct coupled optical delivery system ensures efficient
transfer of this energy to the Smart Filter sub-assembly. The Smart
Filter incorporates all of the necessary optical and electronic
components needed to transfer an image onto the substrate. Using
proven optical design techniques, the projected image is free of
distortion and uniform throughout the exposure area. A WindowsTMbased
personal computer is interfaced directly to the Smart Filter,
which provides the image for the exposure process and shutter control
when an automated system is purchased.
Light emanating from the Smart Filter is projected directly onto the
surface of the substrate. Since the area of this image is typically only a
few square centimeters, a step and repeat motion is used to expose
the entire surface of the substrate. This can be either a manual or
automated system. Additionally, by using the high-resolution stereo
microscope mounted above the substrate, the user may control image
to substrate alignment. This provides the SF-100 system the capability
of fabricating multi-layer devices. A removable UV filter (shutter) is
placed between the light source and substrate during the alignment
sequence so as to avoid substrate exposure during image to substrate
alignment. This filter is necessary in order to prevent photo sensitive
material from exposing while the substrate is being aligned to the
image. The filter is lifted out of the light path using an electronically
operated subassembly to provide exposure.
By using the Laser or E-Beam writer to fabricate fine features and then
using the SF-100 to pattern larger features, the user is able to
drastically increase the throughput of his pixel writer without
purchasing an additional pixel writer. Due to the SF-100’s cost
effective design, proven high reliability, and ease of use, the pixel
writer/SF-100 combination maximizes the user’s capital resources,
while providing the ability to fabricate more cost effective
nanotechnology devices.
The result of this mix and match partnership provides the user with:
* Efficient use of capital, by maximizing the throughput of each
exposure system,
* Higher capacity from the existing pixel writer,
* Reduced operational, maintenance, and installation costs when
compared to those for an additional pixel writer, and
* Increased process capabilities by being able to process non-silicon,
non-flat substrates on the SF-100.
Technical Specifications SF-100 Auto
Stage
Light Source : 200 watt Mercury Arc Lamp
Wavelength : 429 nm and 365 nm (g- line
and i- line)
Power Density at : >200mwatt at 429 nm and
Substrate >20mwatt at 365 nm.
Minimum : Standard Config. 20um
Feature Optional Reduction Kit- 5um
Process Time : <10 minutes for 100 mm
silicon wafer (using 3 um
positive photoresist
SF-100 system : 3 ft (915mm) wide X 2ft
Footprint (610 mm) deep(excludingPC)
Substrate Size : Max. 150 mm wide X max.
150 mm deep. Nonstandard
shapes can be
accommodated.
Warranty : 1 year parts and labor, per
current SF-100 standard
product offering
Greyscale : >1000 levels of greyscale
provided as standard
Imaging Array : 1024 X 768 pixels (over
750,000 pixels per exposure)
Manual Operation : available using software
Bench Top : Granite, air Table or
Requirements similar required
Applications in various fields of Science
IIT, Kanpur
ISRO, Ahemedabad
Nanotechnology,
Biotechnology & Microbiology,
Molecular Biophysics & Ceramics,
RF & Microwaves,
Microelectronics,
Micro Mechanics,
Micro Magnetic,
Automotive, Aerospace & Defense,
Medical & Environmental,
Biodetection,
Carbon Nanotubes, Nanofibers, Fullerenes
Microfluidics & Fuel Cell,
3D Device Fabrication,
Microsensors,
Microanalysis and Biochemistry,
Materials Research on curved surfaces,
Chemical Engineering & Cosmetics,
MEMS, Carbon MEMS,
Photoresist Patterning,
Polymers,
Bio-optical Nanotechnology, etc.
Our Indian customers include:
for development of templates for selfassembly
with applications in sub-micron large area
patterning,carbon MEMS, sensors and polymer based
opto-electronics.
for fabricating microelectronic
PCB's for use in future satellites.
For further information please contact
T/727 522 0334 F/727 522 3896
1922 Illinois Avenue NE St. Petersburg, FL 33703-